DEVICE FOR PHOTORESIST COATING BY CENTRIFUGING Russian patent published in 2014 - IPC H01L21/312 G03F7/16 H05K3/00 

Abstract RU 2509390 C1

FIELD: physics.

SUBSTANCE: photoresist coating device has a protective housing with a cover, a substrate holder, nuts and a centrifuge shaft. The protective housing is mounted on the centrifuge shaft. The substrate holder is mounted on the centrifuge shaft and is fastened by nuts. The substrate holder has a base, a cover, stop pins and filling holes. On the inner surfaces of the base and the cover of the holder there are through grooves with a stepped side surface for fitting substrates. Stop pins are placed on the peripheral parts of the substrate holder. The cover of the holder has feed holes.

EFFECT: shorter manufacturing time and high output of non-defective items.

2 cl, 3 dwg

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RU 2 509 390 C1

Authors

Netesin Nikolaj Nikolaevich

Korotkova Galina Petrovna

Korzenev Gennadij Nikolaevich

Povolotskij Sergej Nikolaevich

Karpova Margarita Valer'Evna

Aksenova Ol'Ga Vladimirovna

Tsyganov Aleksandr Borisovich

Russkikh Galina Vladimirovna

Dates

2014-03-10Published

2012-07-18Filed