FIELD: microelectronics. SUBSTANCE: repeated anodic electrodeposition on first aluminium film is made at its butt end. Aluminium layer is covered on top with solid oxide layer and photoresist deposited on it. Partial anodic treatment of aluminium provides for much better adhesion of photoresist. Anodic electrodeposition on open end of film makes it possible to dispense with measures concerting electric potential and to check thickness of formed oxide and, hence, slit width, with high degree of precision. EFFECT: facilitated procedure, improved quality of deposited coat. 7 dwg
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