FIELD: equipment for applying a thin even layer on a base. SUBSTANCE: equipment has two walls limiting the space like a cutting edge preferably converging toward the base; a means for pressurized gas consisting of chamber with gas fed into it by pressure. The chamber communicates with the space through a hole which is placed so as to feed gas into the space parallel to the adjacent wall. This hole may be in the form of a single slit or a number of jets. EFFECT: higher efficiency and accuracy. 14 cl, 4 dwg
