PLASMATRON FOR DEPOSITING, MAINLY, REFRACTORY MATERIALS Russian patent published in 1995 - IPC

Abstract RU 2039613 C1

FIELD: coating deposition. SUBSTANCE: plasmatron has a cathode with a truncated cone on its working end. A cylindrical and a cone surfaces of the cathode are covered by a dielectric layer. The working end of the cathode is arranged in a nozzle-anode in such a way, that their lateral surfaces form a cone duct for focusing particles of a refractory material on an axis of the duct in a zone near the cathode. EFFECT: enhanced quality of coating due to increased density of a jet. 1 cl, 1 dwg

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RU 2 039 613 C1

Authors

Galantsev G.P.

Kovalenko G.D.

Tropin Ju.D.

Nagibin G.E.

Dates

1995-07-20Published

1992-07-01Filed