PLASMATRON Russian patent published in 2004 - IPC

FIELD: plasma treatment of materials and parts using, for instance, plasma-jet plasmatrons. SUBSTANCE: plasmatron designed for evaporating powdered materials including high-melting ones onto surfaces of parts to produce coatings of various functional applications has housing, cathode assembly incorporating point cathode, anode assembly, sectionalized interelectrode insert, electrode coolant supply unit, unit for feeding plasma-generating gas to interelectrode clearance, and unit for feeding powder-carrying transport gas stream to be evaporated. Powder is supplied through cone-shaped channel formed between sections of interelectrode insert toward anode assembly. Outlet section of cone-shaped channel is spaced apart from point cathode along symmetry axis of plasma-forming channel through distance of maximum 3d and minimum 0.5d, where d is flow section diameter of interelectrode insert section closest to cathode. Cone-shaped channel communicates with powder-carrying transport gas stream feeding unit through intermediate annular chamber. Unit incorporates channel affording tangential supply of powder-carrying transport gas stream to intermediate annular chamber. EFFECT: improved uniformity and reduced porosity of coatings due to laminar flow of plasma stream close to powder entrance in arc discharge. 12 cl, 6 dwg