PROCESS OF MANUFACTURE OF DRY FILM PHOTORESIST Russian patent published in 1995 - IPC

FIELD: radio engineering. SUBSTANCE: process of manufacture of dry film photoresist involves casting of water-alkaline emulsion on base of solution including, per cent by mass: swelling agent trichlorineacetic acid 7.0-9.0; bustirane 2.0-3.0; solvent 96% ethanol being the balance, cast layer is dried and produced film is rolled up. Then roll is readily reeled out and base is easily removed after exposure. EFFECT: facilitated manufacture of dry film photoresists. 1 tbl