FIELD: vacuum deposition of layers. SUBSTANCE: apparatus has vacuumizer with substrate and evaporator positioned within vacuumizer. Evaporator provided with heater is divided into two chambers positioned in axial alignment one with respect to the other and to evaporator. Substance to be evaporated is charged into one chamber. Other chamber is made cylindrical and disposed in central part of evaporator. Evaporator bottom has vapor discharge opening with supersonic nozzle. Cover is positioned on upper part of evaporator. EFFECT: improved homogeneity and uniformity of applied layer and efficient usage of mass of substance subjected to evaporation. 2 cl, 3 dwg
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