VACUUM-ARC PLASMA SOURCE Russian patent published in 2002 - IPC

FIELD: vacuum-plasma technology. SUBSTANCE: vacuum-arc plasma source has elongated cylindrical cathode placed inside additional thin-walled cylindrical screen which is longer than cathode and is provided with port along cathode axis used to form working surface along cathode from igniter electrode to arc suppression screen. The latter is placed in a space relation to cylindrical cathode section at current lead. Vacuum chamber functions as anode. Elongated magnetic system is made in the form of loop winding wound on external side of chamber. Such arrangement makes it possible to eliminate impact of its heat in the course of operation on vacuum of 5•10^-5 mm Hg attained in the process. Working space accommodates part being treated which is installed on electrically isolated disk set in rotary motion by means of electric motor. Elongated vacuum-arc plasma source is characterized in rectilinear motion of cathode spots over working surface, trouble-free operation, and reliable arc suppression. EFFECT: enhanced operating reliability of plasma source. 1 cl, 1 dwg