FIELD: manufacture of photodevices. SUBSTANCE: process consists in treatment of surface of sample of CdxHg1-xTe of p-type in plasma of high-frequency with accelerated ions with energy 1-10 eV and current density 4-8 mА/сm2.. Then layer by layer etching of sample is conducted alternated by check of free carriers on surface. Etching is conducted till layer having electron concentration n ≅ 2·1014 cm-3 for x ≅ 0,22. is obtained. EFFECT: facilitated manufacture, increased quality of layers. 2 cl, 2 dwg, 1 tbl
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Authors
Dates
1995-05-20—Published
1992-04-20—Filed