FIELD: plasma technology. SUBSTANCE: method includes preliminary treatment of surface with high-temperature plasma in argon medium followed by adding organometallic compounds into plasma-forming gas and entering it directly into plasma bundle. Method is implemented by aid of plasmotron with discharge chamber 8 having side inlets 18 positioned below electrode system 7 and central inlet 16 with fitting whose cut is disposed in the region of electrode system. EFFECT: improved design. 2 cl, 2 dwg , 1 tbl
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Authors
Dates
1997-05-20—Published
1994-02-22—Filed