METHOD OF CONTROLLED NON-PYROLYTIC REDUCING TREATMENT OF MATERIALS AND DEVICE FOR ITS REALIZATION Russian patent published in 1998 - IPC

FIELD: reducing treatment of organic materials with employment of microwave radiation. SUBSTANCE: the method consists in feeding of organic materials into a microwave chamber, treatment of organic material by microwave radiation and removal of treated organic material from the chamber. Microwave radiation is generated in the chamber by means of generators connected to the array with a subsequent transfer of generated radiation to reflectors focusing the radiation according to the preset directivity pattern and located in such a manner that they assure a uniform distribution of radiation in the chamber. The degree of influence of radiation on organic material in the chamber is controlled, and organic material is fed and removed continuously. Parabolic reflectors are used, which produce a circle directivity pattern. Organic material is treated in successively installed microwave chambers. The antenna position relative to the reflectors is adjusted. The installation for controlled non-pyrolitic reducing treatment of organic material uses a microwave chamber with a microwave radiation generating unit, unit for continuous feeding of organic material to be treated to the chamber, unit for removal of solid and gaseous waste from the chamber. The microwave radiation generating unit uses at least one generated connected to the array, and at least one reflector assuring focused radiation to organic material in directivity pattern. Parabolic reflectors are installed in such a manner that they produce circle directivity patterns and completely overlap the organic material under treatment. The reflector produces a circle directivity pattern, whose diameter exceeds the reflector diameter. The chamber has a plane upper wall with the reflectors flush-mounted with the open side towards the material under treatment. A ceramic tile is installed across the open face side of the reflectors. The antenna is installed for changing the position relative to the reflector. EFFECT: facilitated procedure. 13 cl, 3 dwg