PROCESS OF GAS ANALYSIS AND GEAR FOR ITS REALIZATION Russian patent published in 1998 - IPC

FIELD: gas analysis. SUBSTANCE: in agreement with invention gas sample is ionized in ionization chamber, gas carrier is fed and electric field drawing ion flux from ionization zone to registration zone is created. Equipotential surface is formed on surface limiting cavity of ionization chamber to create drawing electric field. Ionization chamber 1 has ionization source 7, grounded electrode 9, collector 8. Grounded electrode 9 is manufactured in the form of rod. Collector 8 and electrode 9 are fixed in plug 10 with outlet holes 11. Ionization chamber 1 is shut on side of gas injection by wall 2 with distributed holes 3. Surfaces 4, 5 limiting cavity of chamber 1 are connected to power supply source 6. Collector 8 is connected through amplifier 12 to indicator 13. EFFECT: improved authenticity of process. 2 cl, 2 dwg