FIELD: chemical technology. SUBSTANCE: method involves an interaction of dissociated zircon with gaseous hydrogen fluoride at increased temperature. Reaction temperature is regulated for synthesis of at least one zirconium-base compound and at least one silicon-base compound. Silicon-base compound - silicon tetrafluoride is defluorinated further to obtain silicon dioxide and hydrogen fluoride. Zirconium-base compound - zirconium dioxide is processed to obtain technical zirconium dioxide or zirconium dioxide of high purity. EFFECT: improved method of treatment, high purity of the end product. 13 cl, 3 tbl, 5 ex, 11 dwg
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Authors
Dates
1999-01-20—Published
1995-01-30—Filed