DEVICE FOR APPLYING HIGHER VOLTAGES ACROSS SEMICONDUCTOR INTEGRATED CIRCUIT AND ITS OPERATING PROCESS Russian patent published in 1999 - IPC

Abstract RU 2127942 C1

FIELD: electrical engineering. SUBSTANCE: for applying high positive or negative voltages across leads A of device, first p-channel transistor P1 and first n-channel transistor N1 are inserted in series between leads VH1 and VL1 for these respective voltages. Gates of both transistors are connected through load sections of transistors of respective other types of conductivity (N2, P3) to first and third input leads E1,E3. Gates of these transistors are connected to second and, respectively, fourth input leads E2, E3. First p-channel transistor and first n-channel transistor (P1, N1) are interlocked through load sections of transistors of respective polarity of conductivity P1, N3 inserted between gate leads and high positive or negative potential leads VH1, VL1; gates of these transistors are connected to output lead A. Output lead A may be placed at high positive or high negative potential depending on potential across input leads. EFFECT: improved design. 6 cl, 4 dwg

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RU 2 127 942 C1

Authors

Jozef Vinnerl

Dates

1999-03-20Published

1995-12-15Filed