COMPOUND OF MATERIALS FOR LOW-TEMPERATURE INITIATION OF GAS-ABSORBING MATERIAL ACTIVATION PROCESS AND GAS-ABSORBING MEANS CONTAINING IT Russian patent published in 2000 - IPC

Abstract RU 2147386 C1

FIELD: compounds for gas-absorbing materials and means based on them. SUBSTANCE: compound has gas-absorbing alloy and one or more oxides chosen among Ag2O, CuO, MnO2, Co3O4. Third component of alloy or rare-earth elements, yttrium, lanthanum, or their mixture with copper, tin, or their mixtures may be arbitrarily added to these compounds. Novelty is that these compounds are useful for producing gas-absorbing means that can be activated at comparatively low temperatures of 280 to 500 C compared with 350 to 900 C usually required. Description of invention also includes several gas-absorbing materials incorporating mentioned compounds. EFFECT: reduced activation temperature for gas-absorbing system. 34 cl, 14 dwg, 1 tbl, 10 ex

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RU 2 147 386 C1

Authors

Koratstsa Alessio

Boffito Klaudio

Dates

2000-04-10Published

1997-02-05Filed