METHOD AND APPARATUS FOR REMOVING GAS IMPURITIES FROM HYDROGEN FLOW Russian patent published in 1998 - IPC

Abstract RU 2123971 C1

FIELD: gas treatment. SUBSTANCE: step A: hydrogen flow is kept in contact at 5-50 C with one or more granular material layers containing nickel and/or nickel compounds, at least 1 wt % of nickel being present in reduced form, until easily removable impurities are almost completely removed. Step B: flow from step A essentially free of easily removable impurities but still containing harder-to-remove impurities is brought into contact with one or more layers of nonvolatile getter material at higher temperature. EFFECT: improved has treatment quality. 18 cl, 1 dwg, 1 tbl, 3 ex

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RU 2 123 971 C1

Authors

Marko Sukki

Karolina Solcha

Lorimer D'Arsi

Dates

1998-12-27Published

1993-04-24Filed