GAS LASER Russian patent published in 2000 - IPC

Abstract RU 2148882 C1

FIELD: quantum electronics; large and very large continuous-wave and pulse-periodic lasers. SUBSTANCE: gas laser has gas pan with gas pumping device, radiation lead, heat-transfer apparatus, and discharge chamber with two main electrodes connected to power supply so that bottom electrode along gas flow functions as cathode and one additional electrode connected through high-voltage self-maintained discharge pulse generators to main electrodes; additional electrode is placed between main electrodes which have inner ducts to pass gas flow; active surfaces of main and additional electrodes covering gas flow are made in the form of gas-throttling grids; one of sizes of through cells of grids does not exceed 3 mm. EFFECT: improved stability of discharge, pumping pulse repetition rate, power dissipated in gas, and efficiency; reduced size of laser. 1 dwg

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RU 2 148 882 C1

Authors

Osipov V.V.

Ivanov M.G.

Dates

2000-05-10Published

1997-10-16Filed