METHOD FOR PRODUCING INDIVIDUAL HIGH PRECISION IMPLANT FOR COMPENSATING COMPLEX SUBTOTAL POLYOSSEOUS ORBITAL CAVITY DEFECT Russian patent published in 2001 - IPC

FIELD: medicine. SUBSTANCE: method involves measuring middle cranium zone parameters by means of special purpose uniform layer-by- layer tomography information treatment. The received data are used for making synthesis of retained orbit volume parameters and then of the orbit volume parameters for tissues having anatomical defect. Then symmetric, mirror computer transformations are carried out. The parameters being composed (superimposed), their difference estimations are used for determining mathematical spatial parameters of the implant which contact surfaces are adjusted to fit particular anatomical objects of particular person cranium like receiving surfaces of frontal process of the maxilla, zygomatic process of the temporal bone and process of the frontal bone. The complete set of mathematical spatial parameters of individually adjusted implant is exported to automated prototyping device and the implant is manufactured. EFFECT: enhanced accuracy in producing implants; improved anatomical, functional and cosmetic properties. 8 dwg