METHOD OF PLASMA GENERATION AND DEVICE FOR ITS REALIZATION Russian patent published in 2001 - IPC

FIELD: plasma technology. SUBSTANCE: method is related to means for plasma generation with use of external electromagnetic fields and is intended for utilization in low-power, easily transported plants creating SHF plasma that can find use in various branches of industry, such as plasma machining of surfaces of materials, ecological cleaning of effluent of industrial and domestic character from harmful impurities, in medical and biological applications, etc. Oscillations are excited on frequency corresponding to resonance frequency of system formed by SHF radiation source ( magnetron ) 1 and resonator 3, regions of antinode of stabilized standing wave and direction of variation of electric vector in resonator connected to discharge chamber 6 are determined and strong coupling between them is established. Distribution of electromagnetic field is examined in discharge chamber with fixing of regions of antinode. Initiator 4 is placed in region of antinode of resonator and discharge chamber, it is oriented with reference to direction of variations of electric vector in resonator. After it oscillations are excited on frequency corresponding to resonance frequency of system " SHF radiation source-resonator-initiator-discharge chamber ", intensity of electromagnetic field increases to value exceeding breakdown intensity for gas filling discharge chamber initiating by that discharge and plasma is generated under effect of SHF radiation. EFFECT: ensured stability of generation of discharge to form uninterrupted flux of plasma in any gas atmosphere. 14 cl, 5 dwg