FIELD: plasma technologies.
SUBSTANCE: invention relates to the plasma-chemical processing of materials and gas-phase chemical deposition in plasma activated by a microwave field, in particular to technologies for the production of synthetic diamond materials and microwave plasma reactors for the production of synthetic diamond material. A microwave plasma-chemical reactor for producing synthetic diamond contains an axially symmetric reaction chamber, the outer contour of which is formed by a base and a lid, and the internal contour limits the resonant cavity of the reaction chamber, a source of microwave radiation, a waveguide path connected to it, including a cylindrical coaxial waveguide, turning into cone-shaped coaxial waveguide with internal and external cones, dielectric ring transparent to microwave radiation. The internal contour of the reaction chamber is made in the form of three truncated cones, the lower of which has a smaller base associated with the base of the reaction chamber, and its larger base is the large base of the middle truncated cone, the smaller base of which is the large base of the upper truncated cone, the smaller base of which is associated with the upper part of the resonant cavity, while the larger base of the outer cone of the tapered coaxial waveguide is connected to the base of the reaction chamber.
EFFECT: increased purity of the resulting diamond material.
19 cl, 8 dwg
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Authors
Dates
2023-09-19—Published
2022-11-14—Filed