FIELD: heavy-current microwave electronics. SUBSTANCE: method involves production of thin plasma layer that isolates diode of virtual-cathode device from equipotential cavity followed by shaping electronic pulse beam which is injected with current higher than maximum vacuum value into equipotential cavity; suspension of condensed substance particles measuring 0.1 to 1000 mcm is produced in advance at point of production of plasma layer . Virtual-cathode horn implementing proposed method has coaxially arranged cathode electrode and anode electrode bordering equipotential cavity, pulse-voltage supply, output horn with microwave exit aperture, and plasma injectors radially arranged on anode electrode; it also has at least one condensed-substanceparticles injector mounted against one of plasma injectors. EFFECT: enlarged microwave pulse length. 2 cl, 1 dwg
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Authors
Dates
2001-10-20—Published
1999-03-29—Filed