FIELD: chemistry of organoelemental compounds. SUBSTANCE: invention describes copper (I)-organic compounds of the general formula (I) where R1, R2, R3 each means independently C1-8-alkyl group; R4, R5 each means independently CnF2n+1-group; n = 1-6; R6 means hydrogen atom; m = 1 or 2; if m = 1 then means and if m = 2 then means . Invention relates to also a method of precipitation of copper film on backing. Copper (I)-organic compounds of the formula (I) can be used in low-temperature HOGF method for large-scale production of copper film no containing impurities and showing good thermostability. EFFECT: improved method of precipitation. 3 cl, 5 dwg, 3 ex
Authors
Dates
2002-04-27—Published
1999-12-07—Filed