SUBSTRATE STRUCTURE AND METHOD FOR MANUFACTURE THEREOF Russian patent published in 2018 - IPC C23C16/42 C23C16/448 B32B7/02 

FIELD: electricity.

SUBSTANCE: invention relates to a substrate comprising hybrid thin films and to a method for manufacturing the same and can be used to coat light emitters, screens, solar cell elements, and can also be used in various fields, including nanostructuring for the manufacture of semiconductors and electronic devices, chemical sensors and biosensors, in the development of nanotribology, surface modifications, nanoelectronic machine systems (NEMS), microelectronic machine systems (MEMS) and non-volatile memory devices. Substrate comprises hybrid thin films, each of which comprises inorganic and organic layers arranged one on the other on a substrate and represented by the following structural formula 1: [structural formula 1] -[M-X-R1-Y-]m-, wherein m is 1 or more, R1 is a substituted or unsubstituted C_1-20 alkyl, C_5-20 cycloalkyl or aryl, or heteroaryl, having 5 to 60 nuclear atoms, M is selected from the group consisting of Zn, Sn, In, Cd, Ga, Al, Ti, Si, V, Mn, Fe, Co, Cu, Zr, Ru, Mo, Nb and W, wherein X and Y are each selected from the group consisting of O, S, N, NH and CO, and one of X or Y is S.

EFFECT: substrate having a very air-stable organic/inorganic hybrid multilayer molecular film is provided.

17 cl, 25 dwg, 1 tbl, 5 ex