FIELD: new methods of nitrogen trifluoride production used in technologies of semiconductor materials. SUBSTANCE: nitrogen trifluoride is produce by fluorination of carbamide or products of its decomposition by element fluoride in anhydrous hydrogen fluoride at temperature minus 20-0 C and fluorine to initial compounds molar ratio of mot more than 3. Concentration of initial compounds in anhydrous fluorine is 20-50 wt.%. Proposed method is explosion-proof and allows to produce product with maximum content of nitrogen trifluoride and minimal concentration of impurities with yield up to 90%. EFFECT: higher efficiency. 5 cl, 1 tbl, 1 ex
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Authors
Dates
2002-07-10—Published
2001-05-08—Filed