FIELD: methods of production of nitrogen trifluoride. SUBSTANCE: nitrogen trifluoride is used in chemical industry as stable fluorinating agent and fluorine-containing raw material. In rocketry it is used as oxidant for high-energy components; in electronic industry it is used for cleaning crystals of semiconductors and silicon plates. It is also used in lasers and in chemical vapor phase settling apparatus as cleaning gas. Proposed method of obtaining nitrogen trifluoride consists in bringing in interaction reagents contained in heterogeneous phase gas-solid agent. Used as solid phase is ammonium fluoride NH4F•xHF, where "x" ranges from 0.01 to 1.3; interaction with gaseous fluorine is performed at mass ratio of ammonium fluoride of from 0.35 to 500 at 20 to 110 C at forced circulation of reagents. Ammonium fluoride may be used in mixture with inert fluoride of metal of group II or III of Periodic Table, or their mixture. Ammonium fluoride and inert material shall be of the same dispersivity of about 1000-200 mcm. Proposed method is distinguished in high yield of target product at low-cost and easily available raw material. Content of admixtures in product mixture is low as far as safety of process is concerned. EFFECT: reduced power requirements; simple and maintainable equipment. 2 cl, 1 dwg, 1 tbl
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Authors
Dates
2002-05-20—Published
2001-08-22—Filed