FIELD: acoustoelectronics; manufacture of acoustic-surface-wave devices. SUBSTANCE: method involves reduction of thickness of aluminum film used for manufacturing interdigital transducers and reflecting gratings by step-by-step etching in 15-25-% solution of potassium hydroxide at etching temperature of 15-25 C for maximum 10 s during each chemical etching step. EFFECT: reduced labor consumption for element manufacture. 3 dwg
Authors
Dates
2002-10-10—Published
2000-11-30—Filed