FIELD: applying of marking on diamonds. SUBSTANCE: method involves applying resist layer onto diamond surface; performing ablation of selected zone of resist layer for forming mask on diamond surface; providing masked etching of diamond surface for marking diamond surface. Prior to ablation of selected zone of resist, current conductive layer is applied to said zone and electrical connection with current conductive layer is provided during etching procedure for preventing charge accumulation during etching process. Method allows marking invisible with the naked eye to be produced on diamond surface. EFFECT: simplified method and increased resolution of marking. 16 cl, 1 ex
