FIELD: evaporation technique and technology; production of carbon nanopipes. SUBSTANCE: invention relates to deposition of films by magnetron sputtering in vacuum and is used for production of carbon nanopipes. Carbon films are sputtered in a vacuum chamber. The method of magnetron sputtering with application of a direct current is used. Pressure of an inert gas in the chamber is kept of (1-5)•10-2 torr. Direct-current power supply to the target is 40-100 mA. EFFECT: The invention upgrades quality of the produced nanopipes, improves their structural properties, productivity and the films adhesion. 2 dwg
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Authors
Dates
2003-12-10—Published
2002-07-17—Filed