FIELD: ornamental finishing of articles.
SUBSTANCE: invention relates to applying thin-film coatings in vacuum. Method comprises attaching paper shield to article and placing the latter onto rotating table. Then follows ion purification of surface in vacuum (5.7-7.5)·10-2 Pa at voltage 3.5-4.0 kV and ion current 50-100 mA for 10-15 min. Next operation is atomization of titanium cathode via arc vaporization accompanied by ion-plasma precipitation onto articles mounted on rotating table having zero potential against cathode. Arc sputtering of titanium is conducted in vacuum 8.7·10-2 Pa for 90-120 sec at ion current 90-130 A by atomization of titanium cathode. After that, nitrogen is introduced into chamber to deposit titanium nitride for 90-120 sec at ion current 90-130 A and in vacuum 7.5·10-2-1.5·10-1 Pa, which is selected in dependence on desired color of decorative coating.
EFFECT: simplified technology, improved quality of coatings, extended application area of method, in particular for articles of polymer materials.
2 dwg, 1 tbl
