REGULATED AND CONTROLLED ELECTRON SOURCES, ELECTRON-SOURCE MATRIX SYSTEMS, AND THEIR MANUFACTURING PROCESS Russian patent published in 2006 - IPC H01J19/02 

Abstract RU 2273073 C2

FIELD: microelectronics including vacuum microelectronics.

SUBSTANCE: proposed electron source that can be used in field-effect emissive devices, and field-effect emissive cathodes in particular, as well as in other emissive devices, such as field-effect emissive displays, sources for electron guns, microwave devices, and the like has its field-effect emitter formed by whisker epitaxially grown on substrate. Ballast resistor and active area are provided within field-effect emitter and/or on its surface. Ballast resistor can be implemented in the form of n-n+ or p-p+, or p-n semiconductor junctions, or insulating layer transverse to charge-carried flow. Control components for such electron sources are disposed vertically.

EFFECT: enhanced stability and uniformity of electron flows.

48 cl, 7 dwg, 3 ex

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RU 2 273 073 C2

Authors

Givargizov Evgenij Invievich

Givargizov Mikhail Evgen'Evich

Ershov Vladimir Il'Ich

Man'Shina Nina Ivanovna

Dates

2006-03-27Published

1999-04-30Filed