AUTOMATIC PROCESS CONTROL PLANT FOR REDUCING GAS PRODUCTION IN PLASMOCHEMICAL GAS PRODUCER Russian patent published in 2006 - IPC H05B7/148 H05H1/36 F23N5/18 

Abstract RU 2289220 C2

FIELD: control systems for plasma reducing medium producing devices.

SUBSTANCE: proposed system has separate channels for feeding natural gas, atmospheric air, outlet gas, and water; each of mentioned channels incorporates series-connected control unit, flow regulator, and electronic flow sensor, as well as power supply regulator channel. Outputs of all channels are coupled with plasma generator; inputs of control units and outputs of electronic sensors are connected to computer; installed in gas producer output channel are temperature sensor and spectrometer, their outputs being connected to computer. Such arrangement provides for actually completely automatic process control and adherence to specified technology.

EFFECT: reduced power requirement, enhanced environmental friendliness.

1 cl, 1 dwg

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Authors

Neklesa Anatolij Timofeevich

Shiman Igor' Alekseevich

Protsiv Vladimir Vasil'Evich

Necheporenko Vladimir Andreevich

Dates

2006-12-10Published

2005-01-31Filed