FIELD: pulse engineering; generation of subnanosecond pulses for locating devices, charged-particle accelerators, and lasers.
SUBSTANCE: proposed device has pulse-voltage charging source, shaping line, two peaking switches, high-resistance shaping line, output shaping line, and transmitting line; mounted on first electrode of second peaking switch is additional electrode electrically connected to first electrode that encloses it and is disposed coaxially with this electrode.
EFFECT: reduced rise time of subnanosecond pulses.
5 cl, 5 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| SUBNANOSECOND PULSE SHAPER | 2001 |
|
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RU2379781C1 |
| TWIN FORMING LINE | 0 |
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| SUB-NANOSECOND ELECTRONS ACCELERATOR | 2017 |
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RU2666353C1 |
| METHOD AND DEVICE FOR GENERATING HIGH-VOLTAGE PULSES | 1996 |
|
RU2110143C1 |
