METHOD AND ELECTRODE FOR REPLICATION OF PATTERNS IN ELECTRICALLY CONDUCTING MATERIALS Russian patent published in 2007 - IPC C25D5/02 C25F3/14 B21C1/00 

FIELD: processes for electrochemical replication of patterns, design of electrically conducting electrode for creating micro- and(or) nano-structures.

SUBSTANCE: method comprises steps of transferring pattern to substrate by means of electrochemical process with use of setting electrode including counter-electrode to which pattern of insulated material is applied. Close contact of setting electrode with surface of substrate is realized for forming local cavities containing solution of electrolyte. Electrochemical etching/deposition of material onto surface of substrate /setting electrode is also realized. Setting electrode includes counter-electrode and pattern defining structure of cell for electrochemical etching/deposition cell. Said counter -electrode and pattern are integrated into structure of setting electrode while counter-electrode is conducting layer of electrode and pattern defining structure is insulating layer applied onto counter-electrode in such a way that provide arrangement of conducting layer of electrode in pattern.

EFFECT: simplified process for creating micro- and(or) nano-structures, possibility for multiple use of setting electrode, elimination of article finishing up, accurately controlled method having no limitations.

43 cl, 10 dwg