FIELD: chemical engineering.
SUBSTANCE: method of preparing high-dispersity silicon dioxide powder involves generation of gas plasma, introduction of silicon tetrachloride vapors and oxygen-containing gas into gas plasma flow, and subsequent oxidation with oxygen or oxygen-containing gas at 1000-2100°C and ratio of silicon tetrachloride and oxygen molar consumption s between 1.0 and 3.0.
EFFECT: improved quality of product.
3 cl, 1 dwg, 1 tbl
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RU2125018C1 |
