METHOD FOR DETERMINING CONCENTRATION OF ELECTRONS IN PLASMA DEVICES Russian patent published in 2008 - IPC H05H1/00 

FIELD: plasma diagnostics, possible use for measuring electronic concentration of plasma formations of varying geometry in broad range of examination parameters.

SUBSTANCE: method for determining concentration of electrons in plasma devices includes installing a probe into plasma chamber, creating plasma inside it, probing plasma with constant current of low intensity, recording of volt-ampere characteristic, on basis of which concentration of plasma electrons is evaluated. New feature of the method is that under identical conditions for plasma creation, probing and recording of volt-ampere characteristic is performed for spherical probes of varying radius and experimental dependency of values of electronic concentration on radius is built, approximation function is selected, extrapolated to zero radius and on basis of electronic concentration value for zero radius, electronic concentration of unexcited plasma is evaluated.

EFFECT: ensured capability for determining electronic concentration of ionized substance under pressures up to atmospheric value (760 Torr).

2 cl, 1 dwg