PLASMA CLEANING METHOD OF MATERIAL SURFACE COATED WITH ORGANIC COMPOUND AND PLANT FOR PERFORMING THE SAME Russian patent published in 2008 - IPC C23G5/00 C23C14/40 

Abstract RU 2318916 C2

FIELD: cleaning processes of material surface coated with organic compounds.

SUBSTANCE: material 4 is introduced into processing chamber 2; pressure in range 10 mbar - 1 bar is created inside said chamber. Gas flow containing no less than 95 vol.% of oxygen is supplied to chamber 2. Plasma is produced by passing electric current discharge between material surface and electrodes (5a, 5b, 5c, 5d, 5f, 5g) having dielectric coating in order to provide decomposition of organic material by action of generated free radicals 0*. Plant for performing the method includes at least one module having processing chamber 2, unit for pressure control inside chamber in range 10 mbar - 1 bar, unit for 3 moving inside chamber belt 4 connected to housing, row of electrodes (5a, 5b, 5c. 5d, 5e, 5f, 5g) with dielectric coating arranged in front of processed belt 4 and connected with generator 6 of high sine voltage, unit for supplying gas into chamber 2 and unit for discharging gases generated at decomposition of organic compounds of belt 4 coating out of chamber 2.

EFFECT: improved quality of cleaning material surface.

13 cl, 7 dwg, 3 ex, 1 tbl

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RU 2 318 916 C2

Authors

Sil'Berberg Ehrik

Mishel' Ehrik

Ren'E Fransua

Bjuehss-Ehrman Klodin

Dates

2008-03-10Published

2003-02-19Filed