METHOD AND DEVICE FOR PLASMA TREATMENT OF MATERIAL AND PLASMA GENERATION PROCESS Russian patent published in 2003 - IPC

FIELD: plasma engineering; plasma treatment of materials; surface treatment by means of high-pressure discharge. SUBSTANCE: method includes supply of working gas to discharge gap and ignition of electrical discharge by means of extended discharge electrode disposed against surface being treated. Electrode is supplied with intermittently varying voltage to maintain extended discharge at atmospheric pressure, Plasma is generated by supplying gas flow at angle of 10 to 60 deg. to longitudinal axis or to symmetry plane of extended electrode in direction of surface under treatment. Gas is supplied uniformly along extended discharge electrode. Material-treatment gas-distribution device has insulating case provided with tilted gas-feeding channels. Outlet ports of channels are uniformly disposed on gas-distributor case against extended discharge electrode over its length. Material being treated acquires modified properties with high degree of uniformity over its surface by varying both composition of working gas and discharge parameters. EFFECT: improved properties of modified material. 20 cl, 10 dwg