FIELD: process for continuous cleaning of substrate surface without generation of ecologically toxic by-products.
SUBSTANCE: method is designed for cleaning substrate surface at cleaning rate exceeding 10 m/min. Method comprises steps of placing material to treatment zone supplied with gas flow containing oxygen; connecting material to mass; generating plasma at creating electric field between material and at least one electrode coated with dielectric. Created electric field is impulse one; it includes series of pulses with positive and negative values of voltage relative to material. Maximum voltage of positive pulses exceeds voltage Ua of electric arc occurring. Absolute value of maximum voltage of negative pulses is less than value of voltage Ua of electric arc occurring. Apparatus for performing the method includes unit for moving strip of material; row of electrodes coated with dielectric, arranged opposite treated surface of said strip of material and connected to generator; gas supply unit arranged near strip surface; unit for removing gaseous products of decomposition of organic matter coating strip of material.
EFFECT: improved efficiency of cleaning material.
13 cl, 9 dwg, 1 tbl, 3 ex
