DI-CUPROUS OXALATE COMPLEXES AS PRECURSOR MATERIALS FOR DEPOSITING METALLIC COPPER Russian patent published in 2008 - IPC C07F1/08 C07C55/07 C23C18/02 C01G3/00 

Abstract RU 2322447 C2

FIELD: metallic coatings.

SUBSTANCE: invention relates to di-cuprous oxalate complexes stabilized with components of neutral Lewis base. There are described compounds of general formula (I) wherein copper is oxidation state +1 and R represents R-C≡C-R', which has at least one silyl group, R'HC=CHR containing at least one silyl group, or R'Si-C=C-R', where R represents A or at least one group SiR'3, R' represents R, H, or A, wherein L, R, and R', independently of each other, each can assume identical or different significances in different molecule positions, and A represents C1-C30-alkyl with nonbranched or branched chain. Described is also a method of preparing compounds of general formula (I) and a method of preparing high-cleaned thin copper layers.

EFFECT: enabled preparation of heat resistant fluorine-free copper(I) precursors for depositing metallic copper.

21 cl, 4 dwg, 4 ex

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RU 2 322 447 C2

Authors

Keler Katrin

Mejer Frank

Dates

2008-04-20Published

2003-06-05Filed