DICOPPER (I) OXALATE COMPLEXES AS PRECURSORS FOR DEPOSITION OF COPPER METAL Russian patent published in 2010 - IPC C07F1/08 

Abstract RU 2382043 C2

FIELD: chemistry.

SUBSTANCE: invention relates to dicopper (I) oxalate complexes stabilised with a neutral Lewis base such as alkynes, and to use of dicopper (I) oxalate complexes as precursors for deposition of copper metal, where the non-cyclic alkynes are used as the neutral Lewis base.

EFFECT: agents have high effectiveness.

8 cl, 2 ex, 2 dwg

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RU 2 382 043 C2

Authors

Keler Katrin

Dates

2010-02-20Published

2004-03-29Filed