FIELD: machine building.
SUBSTANCE: invention relates to the device and method of vacuum deposition designed to deposit films in vacuum onto a substrate film and can be used in machine building branches. The device incorporates a substrate film feed roller, a roller to guide the substrate film into vacuum, a covering roller for the substrate film to run around and get a vacuum-deposited layer with a film with covering, a receiving roller to reel on the film with covering and receiving-guiding roller to retain the vacuum-deposited film with covering layer fed from the covering roller. The device timing appliance allows balancing the velocity of covering roller periphery V1 and velocity of guiding roller periphery V2 so that V1=V2.
EFFECT: elimination of scratching of vacuum-deposited layer.
10 cl, 16 dwg
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Authors
Dates
2008-08-27—Published
2003-12-26—Filed