INSTALLATION FOR VACUUM DEPOSITION AND METHOD FOR COATING SUBSTRATE Russian patent published in 2021 - IPC C23C14/16 C23C14/24 C23C14/34 C23C14/56 

FIELD: mechanical engineering.

SUBSTANCE: invention relates to the technology of continuous deposition of coatings formed from metal or metal alloys. The method for continuous deposition on a moving substrate of coatings formed of at least one metal inside a vacuum deposition unit containing a vacuum chamber comprises a stage in which, in the specified vacuum chamber, metal vapor 5 is ejected through at least two steam ejectors 3, 3' in the direction to both sides of the moving substrate, and a layer of at least one metal is formed on each side by condensation of the ejected vapors, with at least two steam ejectors 3, 3' facing each other, located on both sides of the substrate and positioned respectively at an angle α and α', being between the steam ejector and the axis A perpendicular to the direction of movement of the substrate, the axis of which is in the plane of the substrate, α and α' satisfy the following equations:

(D1+D2)+Le sin α + We cos α = Ws and

(D1+D2)+Le sin α' + We cos α' = Ws,

the angles α and α' in absolute value are higher than 0° and D1 and D2 are the smaller distance between the ejectors and each edge of the substrate along the axis (A), Ws is the width of the substrate, D1 and D2 exceed 0 mm, that is, the edges of the ejector do not extend beyond the edges of the substrate, and the mentioned steam ejectors have a rectangular or trapezoidal shape and contain a slot, and are also determined by the length of the slot Le and the width of the slot We, and the mentioned steam ejectors have the same axis of rotation.

EFFECT: metal substrate obtained by this method is also proposed, coated with at least one metal on both sides, while the coating is evenly deposited, its thickness is 0.1-20 mcm, and the maximum coating thickness exceeds the average thickness by a maximum of 15%.

17 cl, 4 dwg, 1 tbl