FIELD: process engineering.
SUBSTANCE: proposed unit comprises, at least, one loading transfer chamber 2, at least two deposition chambers 4, 5 arranged there behind, at least one discharging transfer chamber 10 and substrate transfer and processing means, and those to displace substrates through or inside said chambers. Said deposition chambers are to be operated at, in fact, identical deposition parameters including gas flow rate and pressure, treatment duration and used chemicals. Said chambers are arranged to make chain of deposition chambers, each performing its part of deposition job.
EFFECT: uniform deposition, higher efficiency.
9 cl, 5 dwg
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Authors
Dates
2012-12-27—Published
2008-02-29—Filed