VACUUM UNIT FOR APPLICATION OF COATINGS Russian patent published in 2012 - IPC C23C14/56 C23C16/54 

Abstract RU 2471015 C2

FIELD: process engineering.

SUBSTANCE: proposed unit comprises, at least, one loading transfer chamber 2, at least two deposition chambers 4, 5 arranged there behind, at least one discharging transfer chamber 10 and substrate transfer and processing means, and those to displace substrates through or inside said chambers. Said deposition chambers are to be operated at, in fact, identical deposition parameters including gas flow rate and pressure, treatment duration and used chemicals. Said chambers are arranged to make chain of deposition chambers, each performing its part of deposition job.

EFFECT: uniform deposition, higher efficiency.

9 cl, 5 dwg

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RU 2 471 015 C2

Authors

Tsindel' Arno

Poppeller Markus

Zimin Dmitrij

Kun Khansjorg

Kershbaumer Jorg

Dates

2012-12-27Published

2008-02-29Filed