METHOD OF PLASMA ION WORKING SOURCE AND PLASMA ION SOURCE Russian patent published in 2017 - IPC H01J3/04 

FIELD: physics.

SUBSTANCE: in the operation process of the plasma ion source, working gas is pretreated into the gas discharge chamber through the gas inlet, a magnetic field is created with the induction vector of the predominantly axial direction against the anode and the cathode, a voltage is applied to the anode and the hollow cathode, a glow discharge is ignited, ions are formed by bombardment of the working gas atoms with the electrons, the pressure in the gas discharge chamber is set below P=10^-2 Torr, while igniting the glow discharge, different concentrations of the gas particles are created in different areas of the interelectrode space by arranging the supersonic flow of the working gas in the predetermined area of the interelectrode gap in the transverse direction to the electric field with the gas flow rate of V=300 m/s. The device of the plasma ion source contains a pump vacuum system connected to the gas discharge chamber with the working gas inlet, the hollow cathode, and anode placed therein, and a magnetic system designed to create a magnetic field in the discharge chamber with the induction vector of the axial direction against the anode and the cathode, it further comprises a confuser, and the gas inlet is designed as a supersonic nozzle, which is a diffuser, wherein the confuser and the diffuser are installed in the interelectrode space of the gas discharge chamber coaxially against each other so that the axis of the confuser and the diffuser is located in the transverse direction to the axis of the anode and cathode at the predetermined distance against the anode and cathode.

EFFECT: providing the ion flow production under the pressure of 10^-2 Torr or lower, simplifying the method and the device construction.

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