FIELD: physics; engineering procedures.
SUBSTANCE: resist layer within at least separate areas is adjoined by conductor layer which when resist is electron ray exposed, scatter primary electrons and/or emits secondary electrons. During method realisation resist layer material and conductor layer material, as well as exposure parameters are matched so that resist layer is exposed out of electronic beam exposure area as well, thus relief pattern produced in such a way has relief elements with inclined side ends.
EFFECT: method allows for simple way of relief pattern formation, which elements have gently sloping surface with acute angle of 89° raise; creates gently sloping patterns of hologram-type.
22 cl, 27 dwg, 1 ex
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF PRODUCING EXPOSED SUBSTRATE | 2004 |
|
RU2344455C2 |
| OPTICALLY CHANGING PROTECTIVE DEVICE | 2007 |
|
RU2431571C2 |
| METHOD OF FORMING RELIEF IMAGE REPRESENTATION | 0 |
|
SU1196796A1 |
| METHOD OF PREPARING NEGATIVE SELECTIVE ETCHING AGENT FOR RESISTANT LAYERS OF CHALCOGENIDE AsS GLASS | 1999 |
|
RU2165902C1 |
| HOLOGRAPHIC GRATING MANUFACTURING PROCESS | 1999 |
|
RU2165637C1 |
| METHOD FOR PRODUCING MULTILAYER ELEMENT AND MULTILAYER ELEMENT | 2014 |
|
RU2664356C2 |
| METHOD FOR FABRICATION OF STRUCTURES IN MICROELECTRONICS | 1999 |
|
RU2145156C1 |
| METHOD OF PRODUCING MICROSTRUCTURES | 2004 |
|
RU2310896C2 |
| METHOD FOR SIMULTANEOUS PRODUCTION OF COPIES AND DIRECT APPLICATION OF MICROSTRUCTURE AND DEVICE WHICH IMPLEMENTS SAID METHOD | 1993 |
|
RU2131615C1 |
| METHOD OF PRODUCING MULTILAYER BODY AND MULTILAYER BODY | 2007 |
|
RU2415026C2 |
