FIELD: technological processes.
SUBSTANCE: electrode that surrounds the receptacle and forms part of pressure reduction chamber intended for receptacle installation and electrode that is installed next to receptacle neck above its opening are installed one opposite to each other and separated with insulating body. This body forms part of pressure reduction chamber. Inlet tube of gas is made of insulating material for guiding gas that is supplied to the mentioned chamber with the help of supply facility of gas that is transformed into plasma for application of diamond-like film of coating onto receptacle wall internal surface. Tube is installed on facility for exhaust of gas that is available in pressure reduction chamber from the bottom part of receptacle part with opening. High-frequency supply facility is connected to electrode that surrounds receptacle, therefore, it is possible to freely ignite plasma and execute discharge.
EFFECT: stabilisation of plasma discharge and prevention of dust adhesion to electrode.
16 cl, 12 dwg, 2 ex, 2 tbl
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Authors
Dates
2008-10-27—Published
2003-05-26—Filed