DEVICE FOR APPLICATION OF COATING BY METHOD OF CHEMICAL DEPOSITION FROM GAS PHASE Russian patent published in 2008 - IPC C23C16/515 C23C16/54 

Abstract RU 2338006 C2

FIELD: technological processes.

SUBSTANCE: invention is related to device and method for application of coating by method of chemical deposition from gas phase (CVD - chemical vapor deposition) and may find application in production of plastic containers with protective coating. Device contains transporter facility, at least one station for application of coating on at least two processed parts, at least one facility for vacuumisation and facility for generation of plasma at least in one subsector of station for application of coating. There is device provided for connection of facility for generation of electromagnet waves with at least one station for application of coating. Transporter facility is arranged with the possibility of displacement of at least one station for application of coating.

EFFECT: provides more economically beneficial application of CVD coating in process of its durable application.

28 cl, 4 dwg

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RU 2 338 006 C2

Authors

Arnol'D Gregor

Bele Shtefan

Ljutringkhaus-Khenkel' Andreas

Biker Matias

Dates

2008-11-10Published

2003-05-26Filed