PLASMA DEVICE FOR CVD Russian patent published in 2015 - IPC C23C16/54 H05H1/46 

FIELD: machine building.

SUBSTANCE: device comprises an evacuated chamber, pair of spraying rollers located in an evacuated chamber, around which the substrate is reeled-up, which is a target for deposition, and a magnetic field generating section, which generates a plasma generating magnetic field on the surface of the spraying rollers, forming a section for deposition, on which a coating is deposited on the named substrate. Pair of spraying rollers comprises the first spraying roller and the second spraying roller separated from the first spraying roller with a gap so that axes of the named rollers are parallel. The magnetic field generating section is located in such a manner that the first spraying section is formed in the counter-space, which is a space between the pair of spraying rollers. The second spraying section is formed on the section, adjacent with a surface of spraying rollers. The given section is located outside of counter-space.

EFFECT: continuous coating deposition using CVD method with high efficiency.

7 cl, 8 dwg