METHOD OF COATING APPLICATION BY METHOD OF DEPOSITION WITH MAGNETRON SCATTERING IN VACUUM Russian patent published in 2008 - IPC C23C14/35 

FIELD: technological processes.

SUBSTANCE: zone of device for application of coatings consists of at least two compartments, the first of which contains the first target, and the second one - the second target. In the first coating layer is applied in metal mode, which consists in the fact that the first target is used and metal layer is applied in atmosphere of gas that does not enter into reaction. In the second compartment layer is applied in transitional mode, which consists in the fact that the second target is used and layer of target material oxide is applied in atmosphere of gas that does not enter into reaction and chemically active gas with the rate slower than the rate of coating layer application in metal mode, or layer is applied in oxide mode, which consist in the fact that the second target is used and layer of target material oxide is applied in atmosphere of gas that does not enter into reaction and chemically active gas with the rate slower than the rate of coating application in transitional mode. Layer of coating in transitional mode or oxide mode is applied with the second target from material with value of free Gibbs energy ΔG, which is equal or less than - 160 kcal/mole O₂, or for the second target during application of layers in transitional mode and oxide mode material is used with the difference between its ΔG and ΔG of the first target material used during application of coating in metal mode of at least 60 kcal/mole O₂.

EFFECT: reduction of total number of zones for application of coatings.

17 cl, 1 tbl