FIELD: physics.
SUBSTANCE: invention refers to development of production power laser technologies, mainly photoionisation CO2(CO)-lasers, as well as Ar:Xe, 2 lasers and can be used for excitation of plasma chemical medium and design of plasma chemical reactors of various applications. Pulse-periodic wide-aperture ultraviolet source based on plasma microline strip or matrix affects molecular or atomic gas additives of low boiling point thus maintaining nonsteady photoionisation discharge.
EFFECT: higher stability of volume dependent discharge, higher discharge heat input power and ensured higher efficiency of laser and plasma chemical devices.
4 cl, 5 dwg
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